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Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate

✍ Scribed by M. Fonrodona; D. Soler; J. Escarré; F. Villar; J. Bertomeu; J. Andreu; A. Saboundji; N. Coulon; T. Mohammed-Brahim

Book ID: 108288970
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 115 KB
Volume: 501
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2005.07.217

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