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CVD-Produced Polycrystalline Silicon Thin Film Prepared by Fluorine-Mediated Crystal Growth on a Glass Substrate and its Thin Film Transistor Application

✍ Scribed by Cheolhyun Lim; Jungwoo Lee; Junichi Hanna


Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
224 KB
Volume
14
Category
Article
ISSN
0948-1907

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