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Thin-oxide thickness measurement in ellipsometry by a wafer rotation method

โœ Scribed by Jenn-Gwo Hwu; I.-Hsiu Ho; Shou-Pin Chou


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
216 KB
Volume
33
Category
Article
ISSN
0038-1101

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Measurement of interfacial area in a pac
โœ J. Andrieu; B. Claudel ๐Ÿ“‚ Article ๐Ÿ“… 1974 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 639 KB

Interfacial area of a column packed with Raschig rings, 10 mm in diameter, is measured by the classical sulfite oxidation method. It is shown that the column behaves as a recycle differential reactor. Values of the interfacial area are compared, on the one hand with those obtained by Vidwans and Sha