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Thin film preparation by plasma and low pressure CVD in a horizontal reactor

✍ Scribed by CE Morosanu; V Soltuz

Book ID: 108390282
Publisher: Elsevier Science
Year: 1981
Tongue: English
Weight: 472 KB
Volume: 31
Category: Article
ISSN: 0042-207X
DOI: 10.1016/s0042-207x(81)80502-7

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