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Growth of diamond thin films by ECR plasma-assisted CVD at low pressures and temperatures

✍ Scribed by Jin, Shu; Moustakas, T.D.


Book ID
121385960
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
865 KB
Volume
2
Category
Article
ISSN
0925-9635

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## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 Β°C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea