Growth of nanocrystalline diamond films
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Potocky, S. ;Kromka, A. ;Potmesil, J. ;Remes, Z. ;Polackova, Z. ;Vanecek, M.
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Article
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2006
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John Wiley and Sons
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English
⚖ 346 KB
## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 °C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea