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Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method

✍ Scribed by Edwin A. Corl; Hans Wimpfheimer


Publisher
Elsevier Science
Year
1964
Tongue
English
Weight
498 KB
Volume
7
Category
Article
ISSN
0038-1101

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The application of total electron yield (TEY) measurements to the determination of layer thicknesses is described, presenting an introduction to the principles of TEY measurements, the instrumentation and the evaluation of measured signals. The formulation of the theoretical correlation between meas