Thickness measurement of SiO2 layers by an interference method
β Scribed by L. Popova; B. Jordanov
- Publisher
- Elsevier Science
- Year
- 1970
- Tongue
- English
- Weight
- 257 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0038-1101
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
A procedure for the determination of the interface layer thickness between the bulk Γlm and the Si substrate SiO 2 from single-wavelength null ellipsometric data is described. The e β ect of the angular errors in the angle of incidence is eliminated because it is found along with the Γlm and interfac
The application of total electron yield (TEY) measurements to the determination of layer thicknesses is described, presenting an introduction to the principles of TEY measurements, the instrumentation and the evaluation of measured signals. The formulation of the theoretical correlation between meas