๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Thermoelectric properties of photo- and thermal CVD boron and boron phosphide films

โœ Scribed by Y. Kumashiro; T. Enomoto; K. Sato; Y. Abe; K. Hirata; T. Yokoyama

Book ID
108194021
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
220 KB
Volume
177
Category
Article
ISSN
0022-4596

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Thermoelectric Properties of Boron and B
Thermoelectric Properties of Boron and Boron Phosphide CVD Wafers
โœ Y. Kumashiro; T. Yokoyama; A. Sato; Y. Ando ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 710 KB

Electrical and thermal conductivities and thermoelectric power of p-type boron and n-type boron phosphide wafers with amorphous and polycrystalline structures were measured up to high temperatures. The electrical conductivity of amorphous boron wafers is compatible to that of polycrystals at high te

Thermoelectric Properties of Boron and B
Thermoelectric Properties of Boron and Boron Phosphide Films
โœ K. Kumashiro; K. Hirata; K. Sato; T. Yokoyama; T. Aisu; T. Ikeda; M. Minaguchi ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 170 KB

Amorphous boron and boron phosphide 5lms were prepared on silica glass by a solid source molecular beam deposition (SSMBD) method and a low-pressure chemical vapor deposition method (LPCVD) by adapting gas source molecular beam deposition at a reactant pressure of 1.33 Pa. The 5lms were characterize

Preparation of Boron and Boron Phosphide
Preparation of Boron and Boron Phosphide Films by Photo- and Thermal Chemical Vapor Deposition Processes
โœ Y Kumashiro; K Sato; S Chiba; S Yamada; D Tanaka; K Hyodo; T Yokoyama; K Hirata ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 240 KB

We have calculated 5rst excitation energies, oscillator strengths, and potential energy surfaces of B 2 H 6 and PH 3 by using an ab initio molecular orbital method to con5rm that the deuterium lamp is e4ective for the excitation of both B 2 H 6 and PH 3 in the photo-chemical vapor deposition (photo-

Preparation and Thermoelectric Property
Preparation and Thermoelectric Property of Boron Thin Film
โœ K. Kamimura; T. Yoshimura; T. Nagaoka; M. Nakao; Y. Onuma; M. Makimura ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 151 KB

Boron thin 5lms were deposited by electron beam evaporation and by pyrolysis of decaborane on quartz substrates. Re6ection electron beam di4raction was used to characterize the crystal structure. The amorphous structure was observed for the 5lm deposited by electron beam evaporation. The 5lm was pol