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Thermally Oxidized InAlN of Different Compositions for InAlN/GaN Heterostructure Field-Effect Transistors

✍ Scribed by P. Kordoš, M. Mikulics, R. Stoklas, K. Čičo, A. Dadgar, D. Grűtzmacher, A. Krost


Book ID
118816376
Publisher
Springer US
Year
2012
Tongue
English
Weight
368 KB
Volume
41
Category
Article
ISSN
0361-5235

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The structure of InAlN/GaN heterostructu
✍ Vilalta-Clemente, A. ;Poisson, M. A. ;Behmenburg, H. ;Giesen, C. ;Heuken, M. ;Ru 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 462 KB

## Abstract In the investigated InAlN/GaN layers, it is shown that the surface morphology and the crystallinity of the alloy critically depend on the In composition. Atomic force microscopy analysis points out that step flow growth is not easily attained in this system. When the InAlN or AlN interl