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Thermal stability of surface and interface structure of atomic layer deposited Al2O3 on H-terminated silicon

✍ Scribed by Gao, K. Y.; Speck, F.; Emtsev, K.; Seyller, Th.; Ley, L.

Book ID
115528965
Publisher
American Institute of Physics
Year
2007
Tongue
English
Weight
622 KB
Volume
102
Category
Article
ISSN
0021-8979

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