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Thermal characteristics of an X-ray mask during pattern transfer

✍ Scribed by D.J. Resnick; S.V. Pendharkar; W.J. Dauksher; K.D. Cummings; M.F. Laudon; B. Romanowicz; P. Renaud; R.L. Engelstad

No coin nor oath required. For personal study only.

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