Heterogeneous Si3N4 growth during SiNx film deposition and thermal nitridation of Si(100): An X-ray photoemission spectroscopy study

✍ Scribed by J.L. Bischoff; F. Lutz; L. Kubler; D. Bolmont

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 465 KB
• Volume: 187
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(90)90113-r