The structural and electrical properties of thermally grown TiO 2 thin films
β Scribed by Chong, Lit Ho; Mallik, Kanad; Groot, C H de; Kersting, Reinhard
- Book ID
- 120004921
- Publisher
- Institute of Physics
- Year
- 2005
- Tongue
- English
- Weight
- 377 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0953-8984
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π SIMILAR VOLUMES
Thin films of TiO 2 were grown on n-type Si substrate by thermal oxidation of Ti films deposited by dc sputtering. The phase purity of TiO 2 was confirmed by Raman spectroscopy, and secondary ion mass spectroscopy was used to analyze the interfacial and chemical composition of the TiO 2 thin films.
Atmospheric pressure chemical vapor deposition (APCVD) of TiO 2 thin films has been achieved onto glass and onto ITO-coated glass substrates, from the reaction of TiCl 4 with ethyl acetate (EtOAc). The effect of the synthesis temperature on the optical, structural and electrochemical properties was