Structural, optical and electrochemical properties of TiO2 thin films grown by APCVD method

✍ Scribed by C. Quiñonez; W. Vallejo; G. Gordillo

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 468 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2010.02.020

✦ Synopsis

Atmospheric pressure chemical vapor deposition (APCVD) of TiO 2 thin films has been achieved onto glass and onto ITO-coated glass substrates, from the reaction of TiCl 4 with ethyl acetate (EtOAc). The effect of the synthesis temperature on the optical, structural and electrochemical properties was studied through spectral transmittance, X-ray diffraction (XRD) and electrochemical impedance spectroscopy (EIS) measurements. It was established that the TiO 2 films deposited onto glass substrate, at temperatures greater than 400 • C grown with rutile type tetragonal structure, whereas the TiO 2 films deposited onto ITO-coated glass substrate grown with anatase type structure. EIS was applied as suitable method to determine the charge transfer resistance in the electrolyte/TiO 2 interface, typically found in dye-sensitized solar cells.