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The resolution of electron beam lithography

✍ Scribed by M.I. Lutwyche


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
191 KB
Volume
17
Category
Article
ISSN
0167-9317

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A conventional TEWSTEM has been used for the fabrication of -10 nm-size structures by electron-beam lithography. The electron microscope provides a versatile tool for studying the lithographic process with control of the beam energy, current, and profile combined with the ability to image both the p