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The experimental study of the main technical parameters influencing the possible resolution of electron beam lithography

✍ Scribed by J. Bönisch; V. Kudryashov; R.E. Burge

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 320 KB
Volume: 17
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(92)90010-o

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