The reaction of SiH2 with no in the IR laser photochemistry of SiH4 - no mixtures
β Scribed by Takaaki Dohmaru; F.W. Lampe
- Book ID
- 108043234
- Publisher
- Elsevier Science
- Year
- 1988
- Tongue
- English
- Weight
- 696 KB
- Volume
- 41
- Category
- Article
- ISSN
- 1010-6030
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
The decomposition mechanism of SiHa('B, ) formed after IR multiple-photon dissociation of SiH., has been investigated by simultaneous acquisition of spontaneous chemiluminescence of SiHr radicals and state-selective two-photon laser-induced fluorescence spectra of the atomic silicon produced Evidenc
Laser-excited fluorescence detection of HSiCl was used to measure the room-temperature kinetics of the reactions of HSiCl with SiH, and Sic&HZ. An upper bound was also obtained for the HSiCl+Hz rate coefficient. Rate coefftcients for insertion of HSiCl into SiH., and SiC12H2 are 3-4 orders of magnit
The rate constants for the reactions SiH,+02, SiH,+NO, and StH,+NO+N, have been measured over the pressure range I-10 Torr at 300 K, by monitoring a SiHl absorption line at 7 19.93 I cm ' using time-resolved diode laser spectroscopy. SiH3 radicals were prepared by pulsed CO2 laser photolysis of CClz