𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The present position and future status of electron beam lithography for VLSI fabrication

✍ Scribed by T. Matsuzaka

Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
386 KB
Volume
35
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

✦ Synopsis

Electron beam lithography is available in fabrication for ASIC-LSIs in order to contribute QTAT process and cost saving for optical reticle making. On the other hand, the optical lithography is facing difficulty in the resolution for isolated pattern arrangement under quarter micron region even if KrF excimer laser lithography is used. It is expected that the electron beam lithography will play a complementary role for the opticallithography.

The mix-and-match strategy will be open the door for the large volume production-use of the electron beam lithography.

πŸ“œ SIMILAR VOLUMES

Effect of Molecular Adsorption on the El
Effect of Molecular Adsorption on the Electrical Conductance of Single Au Nanowires Fabricated by Electron-Beam Lithography and Focused Ion Beam Etching
✍ Ping Shi; Jingying Zhang; Hsin-Yu Lin; Paul W. Bohn πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 560 KB

## Abstract Metal nanowires are one of the potential candidates for nanostructured sensing elements used in future portable devices for chemical detection; however, the optimal methods for fabrication have yet to be fully explored. Two routes to nanowire fabrication, electron‐beam lithography (EBL)