Implementation of electron beam grey scale lithography and proximity effect correction for silicon nanowire device fabrication

✍ Scribed by Jens Bolten; Thorsten Wahlbrink; Mathias Schmidt; Heinrich D.B. Gottlob; Heinrich Kurz

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 661 KB
• Volume: 88
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2010.12.047