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The influence of oxygen partial pressure and total pressure (O2 + Ar) on the properties of tin oxide films prepared by dc sputtering

✍ Scribed by Li-jian Meng; MP dos Santos

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 517 KB
Volume: 45
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(94)90080-9

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