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Influence of the nitrogen partial pressure on the properties of d.c.-sputtered titanium and titanium nitride films

✍ Scribed by G. Lemperière; J.M. Poitevin


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
704 KB
Volume
111
Category
Article
ISSN
0040-6090

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Impedance measurements and photocurrent spectroscopy have been used to examine the dependence on growth rate of the solid state properties of thin ( -c 20 nm) anodic oxide films on titanium. At room temperature, the relative permittivity and defect concentration profiles in the oxide were found to d