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Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering

✍ Scribed by Chaun Gi Choi; Kwangsoo No; Won-Jae Lee; Ho-Gi Kim; Soo Ok Jung; Won Jong Lee; Wook Sung Kim; Se Jong Kim; Cheon Yoon

No coin nor oath required. For personal study only.

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