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The Influence of NH[sub 4]F on the Etch Rates of Undoped SiO[sub 2] in Buffered Oxide Etch

โœ Scribed by Proksche, Harald


Book ID
118213867
Publisher
The Electrochemical Society
Year
1992
Tongue
English
Weight
413 KB
Volume
139
Category
Article
ISSN
0013-4651

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