The Effect of Aluminum vs. Photoresist Masking on the Etching Rates of Silicon and Silicon Dioxide in CF[sub 4]∕O[sub 2] Plasmas

✍ Scribed by Fedynyshyn, Theodore H.

• Book ID: 121671451
• Publisher: The Electrochemical Society
• Year: 1987
• Tongue: English
• Weight: 469 KB
• Volume: 134
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2100408