✦ LIBER ✦
7345. The importance of free radical recombination reactions in CF4/O2 plasma etching of silicon: M Dalvie and K F Jenson, J Vac Sci Technol, A8, 1990, 1648–1653
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 150 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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