On the LPCVD-Formed SiO2Etching Mechanism in CF4/Ar/O2Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure

✍ Scribed by Son, Jinyoung; Efremov, Alexander; Chun, Inwoo; Yeom, Geun Young; Kwon, Kwang-Ho

• Book ID: 121557351
• Publisher: Springer
• Year: 2014
• Tongue: English
• Weight: 540 KB
• Volume: 34
• Category: Article
• ISSN: 0272-4324
• DOI: 10.1007/s11090-013-9513-1