𝔖 Bobbio Scriptorium
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Effect of H[sub 2] addition on surface reactions during CF[sub 4]/H[sub 2] plasma etching of silicon and silicon dioxide films

✍ Scribed by Marra, Denise C.


Book ID
121816767
Publisher
AVS (American Vacuum Society)
Year
1997
Tongue
English
Weight
520 KB
Volume
15
Category
Article
ISSN
0734-2101

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