Morphology and electronic transport of polycrystalline silicon films deposited by SiF[sub 4]/H[sub 2] at a substrate temperature of 200 °C

✍ Scribed by Hazra, Sukti; Mukhopadhyay, Sumita; Ray, Swati

• Book ID: 121687205
• Publisher: AVS (American Vacuum Society)
• Year: 2002
• Tongue: English
• Weight: 415 KB
• Volume: 20
• Category: Article
• ISSN: 0734-2101
• DOI: 10.1116/1.1469008