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The influence of deposition parameters on the growth of a-SiGe:H alloys in a plasma CVD system

✍ Scribed by M. Zeman; I. Ferreira; M.J. Geerts; J.W. Metselaar

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
386 KB
Volume
46
Category
Article
ISSN
0169-4332

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