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Silane plasma parameters and their dependence on the deposition conditions of PECVD a-Si:H films

✍ Scribed by Xi Zhonghe; Yang Fan; Xu Feng; Zhang Guanghuai; Lin Hongyi; Hu Jianfang

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 125 KB
Volume: 42
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(91)91409-h

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