Plasma conditions for the deposition of TiN by biased activated reactive evaporation and dependence of the resistivity on prefered orientation: B H Hahn et al, Thin Solid Films, 153, 1987, 115–122

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 160 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90392-8