Plasma conditions for the deposition of TiN by biased activated reactive evaporation and dependence of the resistivity on preferred orientation

✍ Scribed by B.H. Hahn; J.H. Jun; J.H. Joo

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 983 KB
• Volume: 153
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(87)90175-1