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CW CO2 laser CVD of amorphous hydrogenated silicon (a-Si:H): influence of the deposition geometry

✍ Scribed by E. Golusda; R. Lange; K.-D. Lühmann; G. Mollekopf; M. Wacker; H. Stafast


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
272 KB
Volume
54
Category
Article
ISSN
0169-4332

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