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The incorporation of oxygen impurities in semiconductor silicon in chemical vapour deposition

✍ Scribed by K. Bartsch; E. Wolf

Publisher: John Wiley and Sons
Year: 1982
Tongue: English
Weight: 302 KB
Volume: 17
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.2170170309

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