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The impact of interface/border defect on performance and reliability of high-k/metal-gate CMOSFET

โœ Scribed by Yeh, Wen-Kuan; Chen, Po-Ying; Gan, Kwang-Jow; Wang, Jer-Chyi; Lai, Chao Sung

Book ID
123270061
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
921 KB
Volume
53
Category
Article
ISSN
0026-2714

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In this paper, we report a study to understand the fin width dependence on performance, variability and reliability of n-type and p-type triple-gate fin field effect transistors (FinFETs) with high-k dielectric and metal gate. Our results indicate that with decreasing fin width the well-known perfor