The Improvement of High-$k$/Metal Gate pMOSFET Performance and Reliability Using Optimized Si Cap/SiGe Channel Structure

✍ Scribed by Yeh, Wen-Kuan; Chen, Yu-Ting; Huang, Fon-Shan; Hsu, Chia-Wei; Chen, Chun-Yu; Fang, Yean-Kuen; Gan, Kwang-Jow; Chen, Po-Ying

• Book ID: 120177020
• Publisher: IEEE
• Year: 2011
• Tongue: English
• Weight: 719 KB
• Volume: 11
• Category: Article
• ISSN: 1530-4388
• DOI: 10.1109/TDMR.2010.2065806