Selective epitaxial growth of Ge and SiG
Selective epitaxial growth of Ge and SiGe using Si2H6 gas and Ge solid source molecular beam epitaxy
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Hiroyuki Wado; Tadami Shimizu; Seiji Ogura; Makoto Ishida; Tetsuro Nakamura
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Article
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1995
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Elsevier Science
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English
β 445 KB