𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The growth properties of SiGe films on Si(100) using Si2H6 gas and Ge solid source molecular beam epitaxy

✍ Scribed by Hiroyuki Wado; Tadami Shimizu; Makoto Ishida; Tetsuro Nakamura


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
433 KB
Volume
147
Category
Article
ISSN
0022-0248

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES