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The growth processes of thin film silicides in Si/Ni planar systems

โœ Scribed by G. Majni; M. Costato; F. Panini

Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
369 KB
Volume
125
Category
Article
ISSN
0040-6090

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Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si
โœ L.W. Cheng; H.M. Lo; S.L. Cheng; L.J. Chen; C.J. Tsai ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 602 KB

Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha