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Time-resolved study of thin nickel silicide layer growth at the nickel film-Si(100) interface

✍ Scribed by P.K. John; H. Frolich; A.C. Rastogi; B.Y. Tong

Publisher: Elsevier Science
Year: 1988
Tongue: English
Weight: 299 KB
Volume: 164
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(88)90180-0

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