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Growth of amorphous silicide during Ti/Si interfacial reactions in multilayer thin films

✍ Scribed by E. Ma

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 411 KB
Volume: 398
Category: Article
ISSN: 0921-5093
DOI: 10.1016/j.msea.2005.02.059

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