The possibility of thin film structural modification during reactive cosputtering of Ti-Si and Ti-Al in nitrogen

✍ Scribed by G. Beensh-Marchwicka; L. Krol-Stepniewska; W. Posadowski

• Publisher: Elsevier Science
• Year: 1981
• Tongue: English
• Weight: 28 KB
• Volume: 85
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(81)90134-6