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The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition

โœ Scribed by Li-Jian Meng; Jinsong Gao; M.P. dos Santos; Xiaoyi Wang; Tongtong Wang


Book ID
108289753
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
572 KB
Volume
516
Category
Article
ISSN
0040-6090

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## Abstract Indium tin oxide (ITO) films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique (IBAD) at different ion beam currents (80โ€“120 mA). The effect of the ion beam current on films properties has been studied. The films prepared at low ion

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## Abstract Indium tin oxide (ITO) thin films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique at different deposition rates (0.1โ€“0.3โ€‰nm/s). The effects of the deposition rate on the structural, optical and electrical properties of the deposite