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Properties of indium oxide/tin oxide multilayered films prepared by ion-beam sputtering

โœ Scribed by Takeyuki Suzuki; Tsutomu Yamazaki; Harunobu Oda

Publisher
Springer
Year
1988
Tongue
English
Weight
446 KB
Volume
23
Category
Article
ISSN
0022-2461

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Indium tin oxide thin films prepared by
Indium tin oxide thin films prepared by ion beam assisted deposition technique at different ion beam currents
โœ Meng, Lijian ;Gao, Jinsong ;Teixeira, V. ;dos Santos, M. P. ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 664 KB

## Abstract Indium tin oxide (ITO) films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique (IBAD) at different ion beam currents (80โ€“120 mA). The effect of the ion beam current on films properties has been studied. The films prepared at low ion