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Effect of the deposition rate on ITO thin film properties prepared by ion beam assisted deposition (IBAD) technique

✍ Scribed by Meng, Li-Jian ;Teixeira, V. ;dos Santos, M. P.

Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
507 KB
Volume
207
Category
Article
ISSN
0031-8965

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✦ Synopsis

Abstract

Indium tin oxide (ITO) thin films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique at different deposition rates (0.1–0.3 nm/s). The effects of the deposition rate on the structural, optical and electrical properties of the deposited films have been studied. The optical constants of the deposited films were calculated by fitting the transmittance spectra using the semi‐quantum model. Considering the application for the electromagnetic wave shielding which needs a high IR reflectance, the optimising deposition rate is 0.2 nm/s. The films prepared at this deposition rate shows a relative high IR reflectance (60%), a good electrical conductivity (5 × 10^βˆ’3^ Ω cm), and a reasonable transmittance in the visible region (over 80%).

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