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The effect of native oxide on thin gate oxide integrity

✍ Scribed by Chin, A.; Lin, B.C.; Chen, W.J.; Lin, Y.B.; Tsai, C.

Book ID: 126536041
Publisher: IEEE
Year: 1998
Tongue: English
Weight: 71 KB
Volume: 19
Category: Article
ISSN: 0741-3106
DOI: 10.1109/55.728901

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## Abstract The detection of metallic contaminants in microelectronics devices is one of the main issues in production line. In fact they could diffuse rapidly into the silicon bulk and establishing energy states into the silicon energy‐band gap. The presence of trace of metals on the silicon surfa