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The comparisons of growth mechanisms for Si thin films with different deposition rates in CVD process by the description of the roughness evolution

✍ Scribed by F. Liu; Z. Sun; W. Zi; Y. Zhou; M. Zhu


Book ID
116671010
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
454 KB
Volume
354
Category
Article
ISSN
0022-3093

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