Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

✍ Scribed by A. Lamperti; S. Spiga; H.L. Lu; C. Wiemer; M. Perego; E. Cianci; M. Alia; M. Fanciulli

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 385 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.09.039