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Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR

✍ Scribed by Bouchet-Fabre, B.; Fernandez, V.; Gohier, A.; Parent, Ph.; Laffon, C.; Angleraud, B.; Tessier, P.Y.; Minea, T.M.


Book ID
122720259
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
684 KB
Volume
18
Category
Article
ISSN
0925-9635

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Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character