✦ LIBER ✦

Temperature dependence of gas phase reactions of SiF2 with F2 and Cl2

✍ Scribed by A. Freedman; K.E. McCurdy; J. Wormhoudt; P.P. Gaspar

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 528 KB
Volume: 142
Category: Article
ISSN: 0009-2614
DOI: 10.1016/0009-2614(87)80933-8

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✦ Synopsis

Rate constants for reactions of SiFz radicals have been measured at 2 Torr in a high-temperature fast-flow system. The bimolecular reaction rate constant for SiF*+F, over a temperature range of 282-617 K can be expressed as (1.0+0.25)X IO-"exp[ -(1850~2OO)lRT] cm3 molecule-' s-', where R is incal mole-' K-'. The rate constant for SiF2+C12 over a wider temperature range of 282-1000 K showed pronounced curvature at high temperatures and can be best fit by a twoterm expression, 2.1 X 10-'2exp( -8OO/RT) + 1.0X IO-"exp( -8lOO/RT) cm' molecule-' s-l. At room temperature, SiF, reacted readily with atomic oxygen (k2X lo-" cm3 molecule-' s-l) and slowly with atomic hydrogen (&2x lo-" cm6 molecule-2 s-l). No reaction with Hz or 02 was observed over a 282-1400 K temperature range at pressures up to 10 Torr.

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